Authors:
TARASCON RG
NOVEMBRE AE
BOLAN K
BLAKEY M
KNUREK C
FETTER L
HUGGINS HA
LIDDLE JA
NALAMASU O
Citation: Rg. Tarascon et al., LITHOGRAPHIC EVALUATION OF A POSITIVE-ACTING CHEMICALLY AMPLIFIED RESIST SYSTEM UNDER CONVENTIONAL AND PROJECTION ELECTRON-BEAM EXPOSURES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2975-2979
Authors:
TARASCON RG
BOLAN K
BLAKEY M
CAMARDA RM
FARROW RC
FETTER LA
HUGGINS HA
KRAUS JS
LIDDLE JA
MIXON DA
NOVEMBRE AE
WATSON GP
BERGER SD
Citation: Rg. Tarascon et al., LITHOGRAPHIC PERFORMANCE OF A NEGATIVE RESIST UNDER SCATTERING WITH ANGULAR LIMITATION FOR PROJECTION ELECTRON LITHOGRAPHY EXPOSURE AT 100 KEV, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3444-3448