Authors:
SCHAEPKENS M
BOSCH RCM
STANDAERT TEFM
OEHRLEIN GS
COOK JM
Citation: M. Schaepkens et al., INFLUENCE OF REACTOR WALL CONDITIONS ON ETCH PROCESSES IN INDUCTIVELY-COUPLED FLUOROCARBON PLASMAS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(4), 1998, pp. 2099-2107