Authors:
BOYER PT
OLIVIE F
KASSMI K
SCHEID E
SARRABAYROUSE G
MARTINEZ A
Citation: Pt. Boyer et al., ELECTRICAL CHARACTERISTICS OF THIN SILICA LAYERS NITRIDED BY LPCVD NITROGEN-DOPED SILICON, Solid-state electronics, 41(7), 1997, pp. 951-955
Citation: E. Scheid et al., OXIDATION PROPERTIES OF NITROGEN-DOPED SILICON FILMS DEPOSITED FROM SI2H6 AND NH3, JPN J A P 2, 33(3A), 1994, pp. 120000365-120000367