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Results:
1-7
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Results: 7
Authors:
BOYLE DS
DONACHIE WD
Citation: Ds. Boyle et Wd. Donachie, MRAY IS AN ESSENTIAL GENE FOR CELL-GROWTH IN ESCHERICHIA-COLI, Journal of bacteriology (Print), 180(23), 1998, pp. 6429-6432
Authors:
BOYLE DS
WINFIELD JM
Citation: Ds. Boyle et Jm. Winfield, CHEMICALLY-MODIFIED THIN ORGANIC FILMS SUPPORTED ON POLISHED SILICA SUBSTRATES, Journal of materials chemistry, 7(10), 1997, pp. 2039-2042
Authors:
BOYLE DS
KHATTAR MM
ADDINALL SG
LUTKENHAUS J
DONACHIE WD
Citation: Ds. Boyle et al., FTSW IS AN ESSENTIAL CELL-DIVISION GENE IN ESCHERICHIA-COLI, Molecular microbiology, 24(6), 1997, pp. 1263-1273
Authors:
KHATTAR MM
ADDINALL SG
STEDUL KH
BOYLE DS
LUTKENHAUS J
DONACHIE WD
Citation: Mm. Khattar et al., 2 POLYPEPTIDE PRODUCTS OF THE ESCHERICHIA-COLI CELL-DIVISION GENE FTSW AND A POSSIBLE ROLE FOR FTSW IN FTSZ FUNCTION, Journal of bacteriology, 179(3), 1997, pp. 784-793
Authors:
BOYLE DS
WINFIELD JM
Citation: Ds. Boyle et Jm. Winfield, CHEMOMECHANICAL POLISHING OF SILICA AND SILICON BY FLUORIDE-BASED ANDOXIDE-BASED REAGENTS - IDENTIFICATION OF A REACTION INTERMEDIATE, Journal of materials chemistry, 6(2), 1996, pp. 227-232
Authors:
BENDADA A
BOYLE DS
MCGHEE L
WEBB G
WINFIELD JM
Citation: A. Bendada et al., REACTIONS ON FLUORINATED SURFACES, Journal of fluorine chemistry, 71(2), 1995, pp. 175-175
Authors:
BOYLE DS
CHUDEK JA
HUNTER G
JAMES D
LITTLEWOOD MI
MCGHEE L
ROBERTSON MI
WINFIELD JM
Citation: Ds. Boyle et al., DIRECT EVIDENCE FOR THE FORMATION OF A PASSIVATING LAYER DURING CHEMOMECHANICAL POLISHING OF SILICA BY A HYDROGEN DIFLUORIDE-BASED REAGENT, Journal of materials chemistry, 3(8), 1993, pp. 903-904
Risultati:
1-7
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