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Authors: WALLRAFF GM ALLEN RD HINSBERG WD LARSON CF JOHNSON RD DIPIETRO R BREYTA G HACKER N KUNZ RR

Citation: Gm. Wallraff et al., SINGLE-LAYER CHEMICALLY AMPLIFIED PHOTORESISTS FOR 193-NM LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2783-2788