EFFECT OF PHOTO ACID GENERATOR CONCENTRATION ON THE PROCESS LATITUDE OF A CHEMICALLY AMPLIFIED RESIST

Authors
PETRILLO KE POMERENE ATS BABICH ED SEEGER DE HOFER D BREYTA G ITO H
Citation
Ke. Petrillo et al., EFFECT OF PHOTO ACID GENERATOR CONCENTRATION ON THE PROCESS LATITUDE OF A CHEMICALLY AMPLIFIED RESIST, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3863-3867
Citations number
10
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
12
Issue
6
Year of publication
1994
Pages
3863 - 3867
Database
ISI
SICI code
1071-1023(1994)12:6<3863:EOPAGC>2.0.ZU;2-N