Authors: BUAUD PP HU YZ SPANOS L IRENE EA CHRISTENSEN KN VENABLES D MAHER DM

Citation: Pp. Buaud et al., A STUDY OF SILICON EPITAXIAL-GROWTH ON SILICON SUBSTRATES EXPOSED TO AR ELECTRON-CYCLOTRON-RESONANCE PLASMAS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(4), 1995, pp. 1442-1446

Authors: HU YZ BUAUD PP SPANOS L WANG YQ LI M IRENE EA

Citation: Yz. Hu et al., IN-SITU ELECTRON-CYCLOTRON-RESONANCE PLASMA SURFACE CLEANING OF SILICON, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 1315-1321

Authors: HU YZ BUAUD PP WANG Y SPANOS L IRENE EA

Citation: Yz. Hu et al., IN-SITU INVESTIGATION OF SILICON SURFACE CLEANING AND DAMAGE BY ARGONELECTRON-CYCLOTRON-RESONANCE PLASMAS, Applied physics letters, 64(10), 1994, pp. 1233-1235

Authors: BUAUD PP DHEURLE FM CHEVACHAROENKUL S IRENE EA

Citation: Pp. Buaud et al., INSITU STRAIN-MEASUREMENTS DURING THE FORMATION OF PALLADIUM SILICIDEFILMS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(2), 1993, pp. 304-310