Citation: I. Ban et al., Crystal structure and thermal analysis of hydroxylammonium hexafluorotitanate(IV) dihydrate and hydroxylammonium hexafluoroindate, MONATS CHEM, 130(3), 1999, pp. 401-408
Authors:
Ban, I
Ozturk, MC
Misra, V
Wortman, JJ
Venables, D
Maher, DM
Citation: I. Ban et al., A low-thermal-budget in situ doped multilayer silicon epitaxy process for MOSFET channel engineering, J ELCHEM SO, 146(3), 1999, pp. 1189-1196
Citation: I. Ban et Mc. Ozturk, In situ phosphorus doping during silicon epitaxy in an ultrahigh vacuum rapid thermal chemical vapor deposition reactor, J ELCHEM SO, 146(11), 1999, pp. 4303-4308