Authors: Celler, GK Barr, DL Rosamilia, JM

Citation: Gk. Celler et al., Etching of silicon by the RCA Standard Clean 1, EL SOLID ST, 3(1), 2000, pp. 47-49

Authors: Watson, GP Kizilyalli, IC Miller, M Wang, YT Pati, B Cirelli, RA Nalamasu, O Radosevich, J Kohler, R Freyman, R Baumann, F Klemens, F Mansfield, W Vaidya, H Frackoviak, J Timko, A Barr, DL Bolan, K

Citation: Gp. Watson et al., A 2 million transistor digital signal processor with 120 nm gates fabricated by 248 nm wavelength phase shift technology, MICROEL ENG, 53(1-4), 2000, pp. 101-104