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Citation: T. Bearda et al., Morphology change of artificial crystal originated particles, and the effect on gate oxide integrity, JPN J A P 2, 39(8B), 2000, pp. L841-L843

Authors: Bearda, T Mertens, PW Heyns, MM Wallinga, H Woerlee, P

Citation: T. Bearda et al., Breakdown and recovery of thin gate oxides, JPN J A P 2, 39(6B), 2000, pp. L582-L584

Authors: Bearda, T Mertens, PW Heyns, MM Schmolke, R

Citation: T. Bearda et al., Fabrication and characterization of artificial crystal originated particles, JPN J A P 2, 38(12B), 1999, pp. L1509-L1511

Authors: Mertens, PW Bearda, T Houssa, M Loewenstein, LM Cornelissen, I De Gendt, S Kenis, K Teerlinck, I Vos, R Meuris, M Heyns, MM

Citation: Pw. Mertens et al., Advanced cleaning for the growth of ultrathin gate oxide, MICROEL ENG, 48(1-4), 1999, pp. 199-206

Authors: Heyns, MM Bearda, T Cornelissen, I De Gendt, S Degraeve, R Groeseneken, G Kenens, C Knotter, DM Loewenstein, LM Mertens, PW Mertens, S Meuris, M Nigam, T Schaekers, M Teerlinck, I Vandervorst, W Vos, R Wolke, K

Citation: Mm. Heyns et al., Cost-effective cleaning and high-quality thin gate oxides, IBM J RES, 43(3), 1999, pp. 339-350

Authors: Bearda, T Houssa, M Mertens, PW Vanhellemont, J Heyns, M

Citation: T. Bearda et al., Observation of critical gate oxide thickness for substrate-defect related oxide failure, APPL PHYS L, 75(9), 1999, pp. 1255-1257