Authors:
Borsoni, G
Le Roux, V
Laffitte, R
Kerdiles, S
Bechu, N
Vallier, L
Korwin-Pawlowski, ML
Vannuffel, C
Bertin, F
Vergnaud, C
Chabli, A
Wyon, C
Citation: G. Borsoni et al., Dependence of ultra-thin SiO2 layers formation by ultra-slow single and multicharged ions on process conditions, MICROEL ENG, 59(1-4), 2001, pp. 311-315