Citation: I. Schmidt et C. Benndorf, Low temperature CVD diamond deposition using halogenated precursors - deposition on low melting materials: Al, Zn and glass, DIAM RELAT, 10(3-7), 2001, pp. 347-351
Citation: S. Petrick et C. Benndorf, Potassium adsorption on hydrogen- and oxygen-terminated diamond(100) surfaces, DIAM RELAT, 10(3-7), 2001, pp. 519-525
Citation: M. Towe et C. Benndorf, Titanium containing DLC coatings from a PACVD process using titanium (IV) isopropylate as a precursor, DIAM RELAT, 9(3-6), 2000, pp. 811-814
Authors:
Gribanova, EV
Zhukov, AN
Antonyuk, IE
Benndorf, C
Baskova, EN
Citation: Ev. Gribanova et al., Effect of the acidity ppof aqueous solutions on the wettability of diamond, graphite and pyrocarbon surfaces, DIAM RELAT, 9(1), 2000, pp. 1-6
Citation: A. Stricker et al., Deposition of titanium oxide and titanium carbide containing thin carbon films in a plasma activated process, DIAM RELAT, 8(2-5), 1999, pp. 500-503