Authors: Farrow, RC Gallatin, GM Waskiewicz, WK Liddle, JA Kizilyalli, I Kornblit, A Biddick, C Blakey, M Klemens, F Felker, J Kraus, J Mkrtchyan, M Orphanos, PA Layadi, N Merchant, S

Citation: Rc. Farrow et al., Marks for SCALPEL((R)) tool optics optimization, MICROEL ENG, 53(1-4), 2000, pp. 309-312

Authors: Farrow, RC Waskiewicz, WK Kizilyalli, I Ocola, L Felker, J Biddick, C Gallatin, G Mkrtchyan, M Blakey, M Kraus, J Novembre, A Orphanos, P Peabody, M Kasica, R Kornblit, A Klemens, F

Citation: Rc. Farrow et al., CMOS compatible alignment marks for the SCALPEL proof of lithography tool, MICROEL ENG, 46(1-4), 1999, pp. 263-266