Authors: Rangelow, IW Biehl, S

Citation: Iw. Rangelow et S. Biehl, Fabrication and electrical characterization of high aspect ratio silicon field emitter arrays, J VAC SCI B, 19(3), 2001, pp. 916-919

Authors: Rangelow, IW Biehl, S

Citation: Iw. Rangelow et S. Biehl, High aspect ratio silicon tips field emitter array, MICROEL ENG, 57-8, 2001, pp. 613-619

Authors: Debski, T Barth, W Rangelow, IW Biehl, S Grabiec, P Bekh, II Lushkin, AE Il'chenko, LG Kostic, I Hudek, P Mitura, S

Citation: T. Debski et al., Gated field emitter arrays, MICROEL ENG, 57-8, 2001, pp. 813-818

Authors: Barth, W Debski, T Shi, F Hudek, P Kostic, I Rangelow, IW Biehl, S Iwert, T Grabiec, P Studzinska, K Mitura, S Bekh, II Lushkin, AE Il'chenko, LG Il'chenko, VV Haindl, G

Citation: W. Barth et al., Field emission cathode array with self-aligned gate electrode fabricated by silicon micromachining, J VAC SCI B, 18(6), 2000, pp. 3544-3548

Authors: Biehl, S Danzebrink, R Oliveira, P Aegerter, MA

Citation: S. Biehl et al., Refractive microlens fabrication by ink-jet process, J SOL-GEL S, 13(1-3), 1998, pp. 177-182