Citation: S. Pau et al., Shape engineering: A novel optical proximity correction technique for attenuated phase-shift mask, J VAC SCI B, 18(6), 2000, pp. 2896-2899
Authors:
Farrow, RC
Gallatin, GM
Waskiewicz, WK
Liddle, JA
Kizilyalli, I
Kornblit, A
Biddick, C
Blakey, M
Klemens, F
Felker, J
Kraus, J
Mkrtchyan, M
Orphanos, PA
Layadi, N
Merchant, S
Citation: Rc. Farrow et al., Marks for SCALPEL((R)) tool optics optimization, MICROEL ENG, 53(1-4), 2000, pp. 309-312
Authors:
Farrow, RC
Waskiewicz, WK
Kizilyalli, I
Ocola, L
Felker, J
Biddick, C
Gallatin, G
Mkrtchyan, M
Blakey, M
Kraus, J
Novembre, A
Orphanos, P
Peabody, M
Kasica, R
Kornblit, A
Klemens, F
Citation: Rc. Farrow et al., CMOS compatible alignment marks for the SCALPEL proof of lithography tool, MICROEL ENG, 46(1-4), 1999, pp. 263-266
Authors:
Farrow, RC
Novembre, AE
Peabody, M
Kasica, R
Blakey, M
Liddle, JA
Werder, K
DeMarco, R
Ocola, L
Rutberg, L
Saunders, T
Unruh, J
Qian, F
Smith, M
Citation: Rc. Farrow et al., Commercialization of SCALPEL masks, J VAC SCI B, 16(6), 1998, pp. 3582-3586