Authors: Liddle, JA Blakey, MI Bolan, K Farrow, RC Gallatin, GM Kasica, R Katsap, V Knurek, CS Li, J Mkrtchyan, M Novembre, AE Ocola, L Orphanos, PA Peabody, ML Stanton, ST Teffeau, K Waskiewicz, WK Munro, E

Citation: Ja. Liddle et al., Space-charge effects in projection electron-beam lithography: Results fromthe SCALPEL proof-of-lithography system, J VAC SCI B, 19(2), 2001, pp. 476-481

Authors: Ocola, LE Li, WY Kasica, RJ Blakey, MI Orphanos, PA Waskiewicz, WK Novembre, AE Sato, M

Citation: Le. Ocola et al., Monte Carlo study of High performance resists for SCALPEL nanolithography, MICROEL ENG, 53(1-4), 2000, pp. 433-436

Authors: Eichner, L Blakey, MI Farrow, RC Liddle, JA Orphanos, PA Waskiewicz, WK

Citation: L. Eichner et al., Optimization of a SCALPEL (R) exposure tool using a diffractive image quality technique, MICROEL ENG, 46(1-4), 1999, pp. 239-242

Authors: Novembre, AE Blakey, MI Farrow, RC Kasica, RJ Knurek, CS Liddle, JA Peabody, ML

Citation: Ae. Novembre et al., Pattern processing results and characteristics for SCALPEL masks, MICROEL ENG, 46(1-4), 1999, pp. 271-274