Authors:
Volland, B
Shi, F
Heerlein, H
Rangelow, IW
Hudek, P
Kostic, I
Cekan, E
Vonach, H
Loeschner, H
Horner, C
Stengl, G
Buschbeck, H
Zeininger, M
Bleeker, A
Benschop, J
Citation: B. Volland et al., Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment, J VAC SCI B, 18(6), 2000, pp. 3202-3206
Citation: Jw. Erisman et al., Evaluation of ammonia emission abatement on the basis of measurements and model calculations, ENVIR POLLU, 102, 1998, pp. 269-274