Authors: Szmanda, CR Brainard, RL Mackevich, JF Awaji, A Tanaka, T Yamada, Y Bohland, J Tedesco, S Dal'Zotto, B Bruenger, W Torkler, M Fallmann, W Loeschner, H Kaesmaier, R Nealey, PM Pawloski, AR

Citation: Cr. Szmanda et al., Measuring acid generation efficiency in chemically amplified resists with all three beams, J VAC SCI B, 17(6), 1999, pp. 3356-3361

Authors: Rao, V Hutchinson, J Holl, S Langston, J Henderson, C Wheeler, DR Cardinale, G O'Connell, D Goldsmith, J Bohland, J Taylor, G Sinta, R

Citation: V. Rao et al., Top surface imaging process and materials development for 193 nm and extreme ultraviolet lithography, J VAC SCI B, 16(6), 1998, pp. 3722-3725