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Results:
1-8
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Results: 8
Authors:
Cunge, G
Chabert, P
Booth, JP
Citation: G. Cunge et al., Absolute fluorine atom concentrations in fluorocarbon plasmas determined from CF2 loss kinetics, J APPL PHYS, 89(12), 2001, pp. 7750-7755
Authors:
Chabert, P
Cunge, G
Booth, JP
Perrin, J
Citation: P. Chabert et al., Reactive ion etching of silicon carbide in SF6 gas: Detection of CF, CF2, and SiF2 etch products, APPL PHYS L, 79(7), 2001, pp. 916-918
Authors:
Booth, JP
Braithwaite, NSJ
Goodyear, A
Barroy, P
Citation: Jp. Booth et al., Measurements of characteristic transients of planar electrostatic probes in cold plasmas, REV SCI INS, 71(7), 2000, pp. 2722-2727
Authors:
Booth, JP
Cunge, G
Biennier, L
Romanini, D
Kachanov, A
Citation: Jp. Booth et al., Ultraviolet cavity ring-down spectroscopy of free radicals in etching plasmas, CHEM P LETT, 317(6), 2000, pp. 631-636
Authors:
Booth, JP
Citation: Jp. Booth, Optical and electrical diagnostics of fluorocarbon plasma etching processes, PLASMA SOUR, 8(2), 1999, pp. 249-257
Authors:
Cunge, G
Booth, JP
Citation: G. Cunge et Jp. Booth, CF2 production and loss mechanisms in fluorocarbon discharges: Fluorine-poor conditions and polymerization, J APPL PHYS, 85(8), 1999, pp. 3952-3959
Authors:
Booth, JP
Cunge, G
Chabert, P
Sadeghi, N
Citation: Jp. Booth et al., CFx radical production and loss in a CF4 reactive ion etching plasma: Fluorine rich conditions, J APPL PHYS, 85(6), 1999, pp. 3097-3107
Authors:
Schwarzenbach, W
Cunge, G
Booth, JP
Citation: W. Schwarzenbach et al., High mass positive ions and molecules in capacitively-coupled radio-frequency CF4 plasmas, J APPL PHYS, 85(11), 1999, pp. 7562-7568
Risultati:
1-8
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