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Results:
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Results: 4
SU-8 as resist material for deep X-ray lithography
Authors:
Cremers, C Bouamrane, F Singleton, L Schenk, R
Citation:
C. Cremers et al., SU-8 as resist material for deep X-ray lithography, MICROSYST T, 7(1), 2001, pp. 11-16
Microfabrication: LIGA-X and applications
Authors:
Kupka, RK Bouamrane, F Cremers, C Megtert, S
Citation:
Rk. Kupka et al., Microfabrication: LIGA-X and applications, APPL SURF S, 164, 2000, pp. 97-110
Sedimentation field-flow fractionation application to Toxoplasma gondii separation and purification
Authors:
Bouamrane, F Assidjo, NE Bouteille, B Dreyfuss, MF Darde, ML Cardot, PJP
Citation:
F. Bouamrane et al., Sedimentation field-flow fractionation application to Toxoplasma gondii separation and purification, J PHARM B, 20(3), 1999, pp. 503-512
Resist dissolution rate and inclined-wall structures in deep x-ray lithography
Authors:
Liu, Z Bouamrane, F Roulliay, M Kupka, RK Labeque, A Megtert, S
Citation:
Z. Liu et al., Resist dissolution rate and inclined-wall structures in deep x-ray lithography, J MICROM M, 8(4), 1998, pp. 293-300
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