Authors: Levesque, A Bouteville, A

Citation: A. Levesque et A. Bouteville, Investigation of the tantalum chlorination with hydrogen chloride for LPCVD tantalum elaboration, J PHYS IV, 11(PR3), 2001, pp. 907-913

Authors: Levesque, A Bouteville, A

Citation: A. Levesque et A. Bouteville, Evaluation of corrosion behaviour of tantalum coating obtained by low pressure chemical vapor deposition using electrochemical polarization, J PHYS IV, 11(PR3), 2001, pp. 915-920

Authors: Benayoun, S Hantzpergue, JJ Bouteville, A

Citation: S. Benayoun et al., Micro-scratch test study of TiN films grown on silicon by chemical vapor deposition, THIN SOL FI, 389(1-2), 2001, pp. 187-193

Authors: de Baynast, H Bouteville, A Remy, JC

Citation: H. De Baynast et al., Optimization of titanium nitride rapid thermal CVD process, CHEM VAPOR, 6(3), 2000, pp. 115-119

Authors: Imhoff, L Bouteville, A de Baynast, H Remy, JC

Citation: L. Imhoff et al., Evaluation and localization of oxygen in thin TiN layers obtained by RTLPCVD from TiCl4-NH3-H-2, SOL ST ELEC, 43(6), 1999, pp. 1025-1029