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Results: 1-25/49
Authors:
Zhang, JY
Dusastre, V
Boyd, IW
Citation: Jy. Zhang et al., Characterisation of ultraviolet annealed tantalum oxide films deposited byphoto-CVD using 172 nm excimer lamp, MAT SC S PR, 4(1-3), 2001, pp. 313-317
Authors:
Yu, JJ
Zhang, JY
Boyd, IW
Citation: Jj. Yu et al., Laser-assisted mechanical texturing of magnetic media, APPL PHYS A, 72(6), 2001, pp. 687-690
Authors:
Yu, JJ
Zhang, JY
Boyd, IW
Lu, YF
Citation: Jj. Yu et al., Excimer-laser-induced micropatterning of silicon dioxide on silicon substrates, APPL PHYS A, 72(1), 2001, pp. 35-39
Authors:
Boyd, IW
Zhang, JY
Citation: Iw. Boyd et Jy. Zhang, Photo-induced growth of dielectrics with excimer lamps, SOL ST ELEC, 45(8), 2001, pp. 1413-1431
Authors:
Shimizu-Iwayama, T
Hama, T
Hole, DE
Boyd, IW
Citation: T. Shimizu-iwayama et al., Characteristic photoluminescence properties of Si nanocrystals in SiO2 fabricated by ion implantation and annealing, SOL ST ELEC, 45(8), 2001, pp. 1487-1494
Authors:
Zhang, JY
Boyd, IW
Citation: Jy. Zhang et Iw. Boyd, Low dielectric constant porous silica films formed by photo-induced sol-gel processing, MAT SC S PR, 3(5-6), 2000, pp. 345-349
Authors:
Kelly, PV
Mooney, MB
Beechinor, JT
O'Sullivan, BJ
Hurley, PK
Crean, GM
Zhang, JY
Boyd, IW
Paillous, M
Jimenez, C
Senateur, JP
Citation: Pv. Kelly et al., Ultraviolet assisted injection liquid source chemical vapour deposition (UVILS-CVD) of tantalum pentoxide, ADV MAT OPT, 10(3-5), 2000, pp. 115-122
Authors:
Zhang, JY
Boyd, IW
Mooney, MB
Hurley, PK
Beechinor, JT
O'Sullivan, BJ
Kelly, PV
Crean, GM
Senateur, JP
Jimenez, C
Paillous, M
Citation: Jy. Zhang et al., Thin tantalum pentoxide films deposited by photo-induced chemical vapor deposition using an injection liquid source, APPL PHYS A, 70(6), 2000, pp. 647-649
Authors:
Zhang, JY
Boyd, IW
Citation: Jy. Zhang et Iw. Boyd, Pulsed laser deposition of tantalum pentoxide film, APPL PHYS A, 70(6), 2000, pp. 657-661
Authors:
Zhang, JY
Boyd, IW
Citation: Jy. Zhang et Iw. Boyd, Multi-wavelength excimer ultraviolet sources from a mixture of krypton andiodine in a dielectric barrier discharge, APP PHYS B, 71(2), 2000, pp. 177-179
Authors:
Kaliwoh, N
Zhang, JY
Boyd, IW
Citation: N. Kaliwoh et al., Titanium dioxide films prepared by photo-induced sol-gel processing using 172 nm excimer lamps, SURF COAT, 125(1-3), 2000, pp. 424-427
Authors:
Kaliwoh, N
Zhang, JY
Boyd, IW
Citation: N. Kaliwoh et al., Photo-induced preparation of (Ta2O5)(1-x)(TiO2)(x) dielectric thin films using sol-gel processing with xenon excimer lamps, APPL SURF S, 168(1-4), 2000, pp. 13-16
Authors:
Kogelschatz, U
Esrom, H
Zhang, JY
Boyd, IW
Citation: U. Kogelschatz et al., High-intensity sources of incoherent UV and VUV excimer radiation for low-temperature materials processing, APPL SURF S, 168(1-4), 2000, pp. 29-36
Authors:
Zhang, JY
Boyd, IW
Citation: Jy. Zhang et Iw. Boyd, Thin tantalum and tantalum oxide films grown by pulsed laser deposition, APPL SURF S, 168(1-4), 2000, pp. 234-238
Authors:
Kaliwoh, N
Zhang, JY
Boyd, IW
Citation: N. Kaliwoh et al., Ultrathin silicon dioxide films grown by photo-oxidation of silicon using 172 nm excimer lamps, APPL SURF S, 168(1-4), 2000, pp. 288-291
Authors:
Zhang, JY
Boyd, IW
Citation: Jy. Zhang et Iw. Boyd, Lifetime investigation of excimer UV sources, APPL SURF S, 168(1-4), 2000, pp. 296-299
Authors:
Zhang, JY
Hopp, B
Geretovszky, Z
Boyd, IW
Citation: Jy. Zhang et al., Photo-deposition of tantalum pentoxide film using 222 nm excimer lamps, APPL SURF S, 168(1-4), 2000, pp. 307-311
Authors:
Zhang, JY
Boyd, IW
Citation: Jy. Zhang et Iw. Boyd, Formation of silicon dioxide layers during UV annealing of tantalum pentoxide film, APPL SURF S, 168(1-4), 2000, pp. 312-315
Authors:
Zhang, JY
Boyd, IW
Citation: Jy. Zhang et Iw. Boyd, Ultraviolet annealing of thin films grown by pulsed laser deposition, APPL SURF S, 154, 2000, pp. 17-21
Authors:
Zhang, JY
Lim, B
Boyd, IW
Citation: Jy. Zhang et al., Deposition and annealing of tantalum pentoxide films using 172 nm excimer lamp, APPL SURF S, 154, 2000, pp. 382-386
Authors:
Boyd, IW
Hanabusa, M
Hess, P
Peled, A
Citation: Iw. Boyd et al., Proceedings of Symposium A on Photo-Excited Processes, Diagnostics and Applications of the 1999 E-MRS Spring Conference - Strasbourg, France, June 1-4, 1999 - Foreword, APPL SURF S, 154, 2000, pp. VII-VIII
Authors:
Waller, D
Coccia, LG
Kilner, JA
Boyd, IW
Citation: D. Waller et al., The effect of pulse duration and oxygen partial pressure on La0.7Sr0.3CoO3-delta and La0.7Sr0.3Co0.2Fe0.8O3-delta films prepared by laser ablation, SOL ST ION, 134(1-2), 2000, pp. 119-125
Authors:
Boyd, IW
Zhang, JY
Citation: Iw. Boyd et Jy. Zhang, Low temperature photoformation of tantalum oxide, MICROEL REL, 40(4-5), 2000, pp. 649-655
Authors:
Iwayama, TS
Hole, DE
Boyd, IW
Citation: Ts. Iwayama et al., Characteristic photoluminescence band in Si+-implanted SiO2 grown on Si wafer, MICROEL REL, 40(4-5), 2000, pp. 849-854
Authors:
Boyd, IW
Mathew, TH
Thomas, MC
Citation: Iw. Boyd et al., COX-2 inhibitors and renal failure: the triple whammy revisited (vol 173, pg 274, 2000), MED J AUST, 173(9), 2000, pp. 504-504