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Results:
1-14
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Results: 14
Monitoring the structural and chemical properties of CNx thin films duringin situ annealing in a TEM
Authors:
Grillo, SE
Hellgren, N
Serin, V
Broitman, E
Colliex, C
Hultman, L
Kihn, Y
Citation: Se. Grillo et al., Monitoring the structural and chemical properties of CNx thin films duringin situ annealing in a TEM, EPJ-APPL PH, 13(2), 2001, pp. 97-105
Authors:
Hellgren, N
Lin, N
Broitman, E
Serin, V
Grillo, SE
Twesten, R
Petrov, I
Colliex, C
Hultman, L
Sundgren, JE
Citation: N. Hellgren et al., Thermal stability of carbon nitride thin films, J MATER RES, 16(11), 2001, pp. 3188-3201
Authors:
De Rosa, H
Cardus, G
Broitman, E
Zimmerman, R
Citation: H. De Rosa et al., Structural properties of AlSn thin films deposited by magnetron sputtering, J MAT SCI L, 20(14), 2001, pp. 1365-1367
Authors:
Broitman, E
Hellgren, N
Wanstrand, O
Johansson, MP
Berlind, T
Sjostrom, H
Sundgren, JE
Larsson, M
Hultman, L
Citation: E. Broitman et al., Mechanical and tribological properties of CNx films deposited by reactive magnetron sputtering, WEAR, 248(1-2), 2001, pp. 55-64
Authors:
Hellgren, N
Johansson, MP
Broitman, E
Sandstrom, P
Hultman, L
Sundgren, JE
Citation: N. Hellgren et al., Effect of chemical sputtering on the growth and structural evolution of magnetron sputtered CNx thin films, THIN SOL FI, 382(1-2), 2001, pp. 146-152
Authors:
Broitman, E
Hellgren, N
Jarrendahl, K
Johansson, MP
Olafsson, S
Radnoczi, G
Sundgren, JE
Hultman, L
Citation: E. Broitman et al., Electrical and optical properties of CNx(0 <= x <= 0.25) films deposited by reactive magnetron sputtering, J APPL PHYS, 89(2), 2001, pp. 1184-1190
Authors:
Hellgren, N
Johansson, MP
Broitman, E
Hultman, L
Sundgren, JE
Citation: N. Hellgren et al., Anisotropies in magnetron sputtered carbon nitride thin films, APPL PHYS L, 78(18), 2001, pp. 2703-2705
Authors:
Zheng, WT
Yu, WX
Li, HB
Wang, YM
Cao, PJ
Jin, ZS
Broitman, E
Sundgren, JE
Citation: Wt. Zheng et al., Chemical bonding, structure, and hardness of carbon nitride thin films, DIAM RELAT, 9(9-10), 2000, pp. 1790-1794
Authors:
Broitman, E
Macdonald, W
Hellgren, N
Radnoczi, G
Czigany, Z
Wennerberg, A
Jacobsson, M
Hultman, L
Citation: E. Broitman et al., Carbon nitride films on orthopedic substrates, DIAM RELAT, 9(12), 2000, pp. 1984-1991
Authors:
Hellgren, N
Johansson, MP
Hjorvarsson, B
Broitman, E
Ostblom, M
Liedberg, B
Hultman, L
Sundgren, JE
Citation: N. Hellgren et al., Growth, structure, and mechanical properties of CNxHy films deposited by dc magnetron sputtering in N-2/Ar/H-2 discharges, J VAC SCI A, 18(5), 2000, pp. 2349-2358
Authors:
Johansson, MP
Hellgren, N
Berlind, T
Broitman, E
Hultman, L
Sundgren, JE
Citation: Mp. Johansson et al., Growth of CNx/BN : C multilayer films by magnetron sputtering, THIN SOL FI, 360(1-2), 2000, pp. 17-23
Authors:
Hellgren, N
Macak, K
Broitman, E
Johansson, MP
Hultman, L
Sundgren, JE
Citation: N. Hellgren et al., Influence of plasma parameters on the growth and properties of magnetron sputtered CNx thin films, J APPL PHYS, 88(1), 2000, pp. 524-532
Authors:
Hellgren, N
Johansson, MP
Broitman, E
Hultman, L
Sundgren, JE
Citation: N. Hellgren et al., Role of nitrogen in the formation of hard and elastic CNx thin films by reactive magnetron sputtering, PHYS REV B, 59(7), 1999, pp. 5162-5169
Authors:
Suenaga, K
Johansson, MP
Hellgren, N
Broitman, E
Wallenberg, LR
Colliex, C
Sundgren, JE
Hultman, L
Citation: K. Suenaga et al., Carbon nitride nanotubulite - densely-packed and well-aligned tubular nanostructures, CHEM P LETT, 300(5-6), 1999, pp. 695-700
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1-14
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