Authors:
Chambers, JJ
Busch, BW
Schulte, WH
Gustafsson, T
Garfunkel, E
Wang, S
Maher, DM
Klein, TM
Parsons, GN
Citation: Jj. Chambers et al., Effects of surface pretreatments on interface structure during formation of ultra-thin yttrium silicate dielectric films on silicon, APPL SURF S, 181(1-2), 2001, pp. 78-93
Authors:
Gustafsson, T
Lu, HC
Busch, BW
Schulte, WH
Garfunkel, E
Citation: T. Gustafsson et al., High-resolution depth profiling of ultrathin gate oxides using medium-energy ion scattering, NUCL INST B, 183(1-2), 2001, pp. 146-153
Citation: Bw. Busch et T. Gustafsson, Thermal expansion and mean-square displacements of the Al(110) surface studied with medium-energy ion scattering, PHYS REV B, 61(23), 2000, pp. 16097-16104
Authors:
Busch, BW
Gustafsson, T
Viefhaus, H
Uebing, C
Citation: Bw. Busch et al., Medium-energy ion scattering study of arsenic and sulfur segregation to the Fe-9% W(100) surface, SURF SCI, 463(2), 2000, pp. 145-155
Authors:
Lu, HC
Gusev, EP
Garfunkel, E
Busch, BW
Gustafsson, T
Sorsch, TW
Green, ML
Citation: Hc. Lu et al., Isotopic labeling studies of interactions of nitric oxide and nitrous oxide with ultrathin oxynitride layers on silicon, J APPL PHYS, 87(3), 2000, pp. 1550-1555
Citation: Bw. Busch et al., Competition of arsenic and sulfur segregation on Fe-9%W(100) single crystal surfaces, APPL PHYS L, 74(23), 1999, pp. 3564-3566