Authors: Klopp, JM Pasini, D Byers, JD Willson, CG Frechet, JMJ

Citation: Jm. Klopp et al., Microlithographic assessment of a novel family of transparent and etch-resistant chemically amplified 193-nm resists eased on cyclopolymers, CHEM MATER, 13(11), 2001, pp. 4147-4153

Authors: Byers, JD Peel, DA

Citation: Jd. Byers et Da. Peel, Non-linear dynamics of inflation in high inflation economies, MANCH SCH, 68, 2000, pp. 23-37

Authors: Havard, JM Shim, SY Frechet, JMJ Lin, QH Medeiros, DR Willson, CG Byers, JD

Citation: Jm. Havard et al., Design of photoresists with reduced environmental impact. 1. Water-solubleresists based on photo-cross-linking of poly(vinyl alcohol), CHEM MATER, 11(3), 1999, pp. 719-725

Authors: Havard, JM Yoshida, M Pasini, D Vladimirov, N Frechet, JMJ Medeiros, DR Patterson, K Yamada, S Willson, CG Byers, JD

Citation: Jm. Havard et al., Design of photoresists with reduced environmental impact. II. Water-soluble resists based on photocrosslinking of poly(2-isopropenyl-2-oxazoline), J POL SC PC, 37(9), 1999, pp. 1225-1236

Authors: McCallum, M Dean, KR Byers, JD

Citation: M. Mccallum et al., Integration considerations for 193nm photoresists, MICROEL ENG, 46(1-4), 1999, pp. 335-338

Authors: Havard, JM Vladimirov, N Frechet, JMJ Yamada, S Willson, CG Byers, JD

Citation: Jm. Havard et al., Photoresists with reduced environmental impact: Water-soluble resists based on photo-cross-linking of a sugar-containing polymethacrylate, MACROMOLEC, 32(1), 1999, pp. 86-94