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Results: 1-10 |
Results: 10
SPECTROSCOPIC ELLIPSOMETRIC CHARACTERIZATION OF TRANSPARENT THIN-FILMAMORPHOUS ELECTRONIC MATERIALS - INTEGRATED ANALYSIS
Authors: POPOV KV TIKHONRAVOV AV CAMPMANY J BERTRAN E BOSCH S CANILLAS A
Citation: Kv. Popov et al., SPECTROSCOPIC ELLIPSOMETRIC CHARACTERIZATION OF TRANSPARENT THIN-FILMAMORPHOUS ELECTRONIC MATERIALS - INTEGRATED ANALYSIS, Thin solid films, 313, 1998, pp. 379-383
APPLICATION OF INFRARED FOURIER-TRANSFORM PHASE-MODULATED ELLIPSOMETRY TO THE CHARACTERIZATION OF SILICON-BASED AMORPHOUS THIN-FILMS
Authors: CANILLAS A PASCUAL E ANDUJAR JL CAMPMANY J BERTRAN E
Citation: A. Canillas et al., APPLICATION OF INFRARED FOURIER-TRANSFORM PHASE-MODULATED ELLIPSOMETRY TO THE CHARACTERIZATION OF SILICON-BASED AMORPHOUS THIN-FILMS, Thin solid films, 313, 1998, pp. 671-675
IN-SITU FAST ELLIPSOMETRIC ANALYSIS OF REPETITIVE SURFACE PHENOMENA
Authors: COSTA J CAMPMANY J CANILLAS A ANDUJAR JL BERTRAN E
Citation: J. Costa et al., IN-SITU FAST ELLIPSOMETRIC ANALYSIS OF REPETITIVE SURFACE PHENOMENA, Review of scientific instruments, 68(8), 1997, pp. 3135-3139
PRESSURE-DEPENDENCE OF PHOTOLUMINESCENCE IN AMORPHOUS-SILICON NANOPOWDER PRODUCED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION
Authors: COSTA J ROURA P SULIMOV NA SARDIN G CAMPMANY J MORANTE JR BERTRAN E
Citation: J. Costa et al., PRESSURE-DEPENDENCE OF PHOTOLUMINESCENCE IN AMORPHOUS-SILICON NANOPOWDER PRODUCED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Materials science and technology, 11(7), 1995, pp. 707-710
PREPARATION OF NANOSCALE AMORPHOUS-SILICON BASED POWDER IN A SQUARE-WAVE-MODULATED RF PLASMA REACTOR
Authors: COSTA J SARDIN G CAMPMANY J BERTRAN E
Citation: J. Costa et al., PREPARATION OF NANOSCALE AMORPHOUS-SILICON BASED POWDER IN A SQUARE-WAVE-MODULATED RF PLASMA REACTOR, Vacuum, 45(10-11), 1994, pp. 1115-1117
PLASMA-DEPOSITED SILICON-NITRIDE FILMS WITH LOW HYDROGEN CONTENT FOR AMORPHOUS-SILICON THIN-FILM TRANSISTORS APPLICATION
Authors: CAMPMANY J ANDUJAR JL CANILLAS A CIFRE J BERTRAN E
Citation: J. Campmany et al., PLASMA-DEPOSITED SILICON-NITRIDE FILMS WITH LOW HYDROGEN CONTENT FOR AMORPHOUS-SILICON THIN-FILM TRANSISTORS APPLICATION, Sensors and actuators. A, Physical, 37-8, 1993, pp. 333-336
OPTICAL, VIBRATIONAL AND COMPOSITIONAL STUDY OF AMORPHOUS-SILICON OXYNITRIDE THIN-FILMS GROWN BY AN RF PLASMA USING N2O-MIXTURES(SIH4 GAS)
Authors: CAMPMANY J ANDUJAR JL CANILLAS A COSTA J BERTRAN E
Citation: J. Campmany et al., OPTICAL, VIBRATIONAL AND COMPOSITIONAL STUDY OF AMORPHOUS-SILICON OXYNITRIDE THIN-FILMS GROWN BY AN RF PLASMA USING N2O-MIXTURES(SIH4 GAS), Applied surface science, 70-1, 1993, pp. 695-700
STUDY OF THIN-FILMS OF TRANSPARENT ELECTRONIC MATERIALS BY PHASE-MODULATED SPECTROELLIPSOMETRY
Authors: CAMPMANY J CANILLAS A ANDUJAR JL COSTA J BERTRAN E
Citation: J. Campmany et al., STUDY OF THIN-FILMS OF TRANSPARENT ELECTRONIC MATERIALS BY PHASE-MODULATED SPECTROELLIPSOMETRY, Thin solid films, 233(1-2), 1993, pp. 223-226
EFFECT OF HYDROGEN DILUTION ON THE GROWTH OF HYDROGENATED AMORPHOUS-SILICON STUDIED BY INSITU PHASE-MODULATED ELLIPSOMETRY
Authors: CANILLAS A CAMPMANY J ANDUJAR JL BERTRAN E
Citation: A. Canillas et al., EFFECT OF HYDROGEN DILUTION ON THE GROWTH OF HYDROGENATED AMORPHOUS-SILICON STUDIED BY INSITU PHASE-MODULATED ELLIPSOMETRY, Thin solid films, 228(1-2), 1993, pp. 109-112
INSITU REAL-TIME ELLIPSOMETRIC STUDY OF THE GROWTH OF RF PLASMA-DEPOSITED AMORPHOUS HYDROGENATED SILICON OXYNITRIDE THIN-FILMS
Authors: CAMPMANY J CANILLAS A ANDUJAR JL COSTA J BERTRAN E
Citation: J. Campmany et al., INSITU REAL-TIME ELLIPSOMETRIC STUDY OF THE GROWTH OF RF PLASMA-DEPOSITED AMORPHOUS HYDROGENATED SILICON OXYNITRIDE THIN-FILMS, Thin solid films, 228(1-2), 1993, pp. 137-140
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