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Results:
1-8
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Results: 8
Authors:
ROTH WC
CARLILE RN
OHANLON JF
Citation: Wc. Roth et al., ELECTRICAL CHARACTERIZATION OF A PROCESSING PLASMA CHAMBER, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(6), 1997, pp. 2930-2937
Authors:
CARLILE RN
Citation: Rn. Carlile, PAPERS FROM THE DUSTY PLASMAS - 95 WORKSHOP ON GENERATION, TRANSPORT,AND REMOVAL OF PARTICLES IN PLASMAS - PREFACE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(2), 1996, pp. 489-489
Authors:
COLLINS SM
BROWN DA
OHANLON JF
CARLILE RN
Citation: Sm. Collins et al., PARTICLE TRAPPING, TRANSPORT, AND CHARGE IN CAPACITIVELY AND INDUCTIVELY-COUPLED ARGON PLASMAS IN A GASEOUS-ELECTRONICS-CONFERENCE-REFERENCE-CELL, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(2), 1996, pp. 634-638
Authors:
KANG JW
CARLILE RN
OHANLON JF
COLLINS SM
Citation: Jw. Kang et al., MAPPING OF RADIO-FREQUENCY PLASMA POTENTIAL THROUGHOUT A PARTICLE TRAPPING REGION USING AN EMISSIVE PROBE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(2), 1996, pp. 639-643
Authors:
KANG J
CARLILE RN
OHANLON JF
Citation: J. Kang et al., RADIO-FREQUENCY COMPENSATED EMISSIVE PROBE, Review of scientific instruments, 67(5), 1996, pp. 1818-1821
Authors:
COLLINS SM
BROWN DA
OHANLON JF
CARLILE RN
Citation: Sm. Collins et al., POSTPLASMA PARTICLE DYNAMICS IN A GASEOUS ELECTRONICS CONFERENCE RF REFERENCE CELL, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(6), 1995, pp. 2950-2953
Authors:
COLLINS SM
OHANLON JF
CARLILE RN
Citation: Sm. Collins et al., EFFECTS OF PARTICLE CLOUDS IN A PLASMA ETCH SYSTEM ON SILICON DIOXIDEWAFER CONTAMINATION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 1397-1402
Authors:
CARLILE RN
GEHA SS
Citation: Rn. Carlile et Ss. Geha, PHYSICAL-PROPERTIES OF CONTAMINATION PARTICLE TRAPS IN A PROCESS PLASMA, Journal of applied physics, 73(10), 1993, pp. 4785-4793
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