Authors: TEDDER LL RUBLOFF GW CONAGHAN BF PARSONS GN

Citation: Ll. Tedder et al., DYNAMIC RATE AND THICKNESS METROLOGY DURING POLY-SI RAPID THERMAL CHEMICAL-VAPOR-DEPOSITION FROM SIH4 USING REAL-TIME IN-SITU MASS-SPECTROMETRY (VOL 14, PG 267, 1996), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(4), 1996, pp. 2680-2680