DYNAMIC RATE AND THICKNESS METROLOGY DURING POLY-SI RAPID THERMAL CHEMICAL-VAPOR-DEPOSITION FROM SIH4 USING REAL-TIME IN-SITU MASS-SPECTROMETRY (VOL 14, PG 267, 1996)

Citation
Ll. Tedder et al., DYNAMIC RATE AND THICKNESS METROLOGY DURING POLY-SI RAPID THERMAL CHEMICAL-VAPOR-DEPOSITION FROM SIH4 USING REAL-TIME IN-SITU MASS-SPECTROMETRY (VOL 14, PG 267, 1996), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(4), 1996, pp. 2680-2680
Citations number
1
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
ISSN journal
07342101
Volume
14
Issue
4
Year of publication
1996
Pages
2680 - 2680
Database
ISI
SICI code
0734-2101(1996)14:4<2680:DRATMD>2.0.ZU;2-A