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Citation: K. Radouane et al., RF discharge modelling in a N2O/SiH4 mixture for SiO2 deposition and comparison with experiment, J PHYS D, 33(11), 2000, pp. 1332-1341

Authors: Date, L Radouane, K Caquineau, H Despax, B Couderc, JP Yousfi, M

Citation: L. Date et al., Analysis of the N2O dissociation by r.f. discharges in a plasma reactor, SURF COAT, 119, 1999, pp. 1042-1048

Authors: Date, L Radouane, K Despax, B Yousfi, M Caquineau, H Hennad, A

Citation: L. Date et al., Analysis of the N2O dissociation in a RF discharge reactor, J PHYS D, 32(13), 1999, pp. 1478-1488