Citation: Je. Castle et Am. Salvi, Interpretation of the Shirley background in x-ray photoelectron spectroscopy analysis, J VAC SCI A, 19(4), 2001, pp. 1170-1175
Citation: Je. Castle et Am. Salvi, Chemical state information from the near-peak region of the X-ray photoelectron background, J ELEC SPEC, 114, 2001, pp. 1103-1113
Citation: P. Singjai et al., Observations on the full honeycomb structure of graphite as imaged by atomic force microscopy, PHIL MAG A, 80(10), 2000, pp. 2445-2456
Authors:
Watts, JF
Leadley, SR
Castle, JE
Blomfield, CJ
Citation: Jf. Watts et al., Adsorption of PMMA on oxidized Al and Si substrates: An investigation by high-resolution X-ray photoelectron spectroscopy, LANGMUIR, 16(5), 2000, pp. 2292-2300
Authors:
Simpson, TRE
Watts, JF
Zhdan, PA
Castle, JE
Digby, RP
Citation: Tre. Simpson et al., A combined atomic force microscopy (AFM)/X-ray photoelectron spectroscopy (XPS) study of organosilane molecules adsorbed on the aluminium alloy L157-T6, J MAT CHEM, 9(11), 1999, pp. 2935-2941
Citation: Je. Castle et Ma. Baker, The feasibility of an XPS expert system demonstrated by a rule set for carbon contamination, J ELEC SPEC, 105(2-3), 1999, pp. 245-256
Citation: Pe. Vickers et al., Quantification routines for adsorption studies in static secondary ion mass spectrometry and the effect of ionisation probability, APPL SURF S, 150(1-4), 1999, pp. 244-254
Citation: Jf. Watts et Je. Castle, The determination of adsorption isotherms by XPS and ToF-SIMS: their role in adhesion science, INT J ADHES, 19(6), 1999, pp. 435-443
Citation: Je. Castle et al., Atomic force microscopy imaging of chloride ions adsorbed on etched polycrystalline copper in dilute HCl, SURF INT AN, 27(8), 1999, pp. 770-775
Citation: Am. Salvi et Je. Castle, The intrinsic asymmetry component of the 'total background' in XP spectra (vol 94, pg 73, 1998), J ELEC SPEC, 97(3), 1998, pp. 265-265
Citation: Am. Salvi et Je. Castle, The intrinsic asymmetry of photoelectron peaks: dependence on chemical state and role in curve fitting (vol 95, pg 45, 1998), J ELEC SPEC, 95(2-3), 1998, pp. 299-299