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Results: 1-10 |
Results: 10
Optimization of post-CMP cleaning process for elimination of CMP slurry-induced metallic contaminations
Authors: Seo, YJ Lee, WS Kim, SY Park, JS Chang, EG
Citation: Yj. Seo et al., Optimization of post-CMP cleaning process for elimination of CMP slurry-induced metallic contaminations, J MAT S-M E, 12(7), 2001, pp. 411-415
Field test results of a semi-active ER suspension system associated with skyhook controller
Authors: Choi, SB Lee, HK Chang, EG
Citation: Sb. Choi et al., Field test results of a semi-active ER suspension system associated with skyhook controller, MECHATRONIC, 11(3), 2001, pp. 345-353
Damage in etching of (Ba,Sr)TiO3 thin films using inductively coupled plasma
Authors: Choi, SK Kim, DP Kim, CI Chang, EG
Citation: Sk. Choi et al., Damage in etching of (Ba,Sr)TiO3 thin films using inductively coupled plasma, J VAC SCI A, 19(4), 2001, pp. 1063-1067
Effects of BCl3 addition on Ar/Cl-2 gas in inductively coupled plasmas forlead zirconate titanate etching (vol 18, pg 1373, 2000)
Authors: An, TH Park, JY Yeom, GY Chang, EG Kim, CI
Citation: Th. An et al., Effects of BCl3 addition on Ar/Cl-2 gas in inductively coupled plasmas forlead zirconate titanate etching (vol 18, pg 1373, 2000), J VAC SCI A, 18(6), 2000, pp. 3012-3013
Etching characteristics of SrBi(2)Ya(2)O(9) film with Ar/CHF3 plasma
Authors: Seo, JW Lee, DH Lee, WJ Yu, BG Kwon, KH Yeom, GY Chang, EG Kim, CI
Citation: Jw. Seo et al., Etching characteristics of SrBi(2)Ya(2)O(9) film with Ar/CHF3 plasma, J VAC SCI A, 18(4), 2000, pp. 1354-1358
Effects of BCl3 addition on Ar/Cl-2 gas in inductively coupled plasmas forlead zirconate titanate etching
Authors: An, TH Park, JY Yeom, GY Chang, EG Kim, CI
Citation: Th. An et al., Effects of BCl3 addition on Ar/Cl-2 gas in inductively coupled plasmas forlead zirconate titanate etching, J VAC SCI A, 18(4), 2000, pp. 1373-1376
Roles of N-2 gas in etching of platinum by inductively coupled Ar/Cl-2/N-2plasmas
Authors: Ryu, JH Kim, NH Kim, HS Yeom, GY Chang, EG Kim, CI
Citation: Jh. Ryu et al., Roles of N-2 gas in etching of platinum by inductively coupled Ar/Cl-2/N-2plasmas, J VAC SCI A, 18(4), 2000, pp. 1377-1380
Study on surface reaction of (Ba,Sr)TiO3 thin films by high density plasmaetching
Authors: Kim, SB Kim, CI Chang, EG Yeom, GY
Citation: Sb. Kim et al., Study on surface reaction of (Ba,Sr)TiO3 thin films by high density plasmaetching, J VAC SCI A, 17(4), 1999, pp. 2156-2161
The etching mechanism of (Ba,Sr)TiO3 films using Cl-2/Ar inductively coupled plasma
Authors: Kim, SB Chang, EG Kim, CI
Citation: Sb. Kim et al., The etching mechanism of (Ba,Sr)TiO3 films using Cl-2/Ar inductively coupled plasma, J KOR PHYS, 35, 1999, pp. S716-S720
A study on the suppression of etch residues by O-2 gas addition in dry etching of Pt film
Authors: Kim, NH Kim, CI Chang, EG Kwon, KH
Citation: Nh. Kim et al., A study on the suppression of etch residues by O-2 gas addition in dry etching of Pt film, J KOR PHYS, 35, 1999, pp. S806-S809
Risultati: 1-10 |