Authors:
Li, YJ
Lau, SP
Tay, BK
Sun, Z
Shi, JR
Cheah, LK
Shi, X
Citation: Yj. Li et al., Field emission from tetrahedral amorphous carbon films with various surface morphologies, DIAM RELAT, 10(8), 2001, pp. 1515-1522
Authors:
Sun, Z
Li, YJ
Chen, GY
Lau, SP
Tay, BK
Chen, JS
Cheah, LK
Citation: Z. Sun et al., Fabrication of carbon nanotube film arrays for field emission flat panel display application, SURF REV L, 8(5), 2001, pp. 505-508
Authors:
Cheah, LK
Shi, X
Liu, E
Tay, BK
Shi, JR
Sun, Z
Citation: Lk. Cheah et al., Influence of hydrogen on the structure and properties of tetrahedral amorphous carbon films obtained by the filtered cathodic vacuum arc technique, PHIL MAG B, 79(10), 1999, pp. 1647-1658
Authors:
Shi, JR
Shi, X
Sun, Z
Liu, E
Yang, HS
Cheah, LK
Jin, XZ
Citation: Jr. Shi et al., Structural properties of amorphous silicon-carbon films deposited by the filtered cathodic vacuum arc technique, J PHYS-COND, 11(26), 1999, pp. 5111-5118
Authors:
Tay, BK
Shi, X
Liu, EJ
Tan, HS
Cheah, LK
Milne, WI
Citation: Bk. Tay et al., Heat treatment of tetrahedral amorphous carbon films grown by filtered cathodic vacuum-arc technique, DIAM RELAT, 8(7), 1999, pp. 1328-1332
Citation: Lk. Cheah et al., Optimization of nitrogenated amorphous carbon films deposited by dual ion beam sputtering, MAT SCI E B, 64(1), 1999, pp. 6-11
Authors:
Liu, E
Shi, X
Tan, HS
Cheah, LK
Sun, Z
Tay, BK
Shi, JR
Citation: E. Liu et al., The effect of nitrogen on the mechanical properties of tetrahedral amorphous carbon films deposited with a filtered cathodic vacuum arc, SURF COAT, 121, 1999, pp. 601-606
Citation: Lk. Cheah et al., Electron field emission from nitrogenated tetrahedral amorphous carbon investigated by current imaging tunneling spectroscopy, APPL SURF S, 143(1-4), 1999, pp. 309-312
Authors:
Tay, BK
Shi, X
Liu, E
Tan, HS
Cheah, LK
Shi, J
Lim, EC
Lee, HY
Citation: Bk. Tay et al., Tribological and optical properties of hydrogen-free amorphous carbon films with varying sp(3)/sp(2) composition, SURF INT AN, 28(1), 1999, pp. 226-230
Citation: Bk. Tay et al., Effects of substrate temperature on the properties of tetrahedral amorphous carbon films, THIN SOL FI, 346(1-2), 1999, pp. 155-161
Citation: Yh. Hu et al., The role of defects in current transport through tetrahedral amorphous carbon-based metal-semiconductor-metal structures, J NON-CRYST, 260(1-2), 1999, pp. 31-40
Authors:
Liu, E
Shi, X
Tay, BK
Cheah, LK
Tan, HS
Shi, JR
Sun, Z
Citation: E. Liu et al., Micro-Raman spectroscopic analysis of tetrahedral amorphous carbon films deposited under varying conditions, J APPL PHYS, 86(11), 1999, pp. 6078-6083
Authors:
Cheah, LK
Shi, X
Shi, JR
Liu, EJ
Silva, SRP
Citation: Lk. Cheah et al., Properties of nitrogen doped tetrahedral amorphous carbon films prepared by filtered cathodic vacuum are technique, J NON-CRYST, 242(1), 1998, pp. 40-48
Authors:
Forrest, RD
Burden, AP
Silva, SRP
Cheah, LK
Shi, X
Citation: Rd. Forrest et al., A study of electron field emission as a function of film thickness from amorphous carbon films, APPL PHYS L, 73(25), 1998, pp. 3784-3786