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Chaix-Pluchery, O
Matko, I
Senateur, JP
Madar, R
La Via, F
Citation: B. Chenevier et al., In situ investigations of the metal/silicon reaction in Ti/Si thin films capped with TiN: Volumetric analysis of the C49-C54 transformation, APPL PHYS L, 79(14), 2001, pp. 2184-2186
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Authors:
Gaidi, M
Hazemann, JL
Matko, I
Chenevier, B
Rumyantseva, M
Gaskov, A
Labeau, M
Citation: M. Gaidi et al., Role of Pt aggregates in Pt/SnO2 thin films used as gas sensors - Investigations of the catalytic effect, J ELCHEM SO, 147(8), 2000, pp. 3131-3138
Authors:
Matko, I
Gaidi, M
Hazemann, JL
Chenevier, B
Labeau, M
Citation: I. Matko et al., Electrical properties under polluting gas (CO) of Pt- and Pd-doped polycrystalline SnO2 thin films: analysis of the metal aggregate size effect, SENS ACTU-B, 59(2-3), 1999, pp. 210-215
Authors:
Ikeda, S
Palleau, J
Torres, J
Chenevier, B
Bourhila, N
Madar, R
Citation: S. Ikeda et al., TEM studies of the microstructure evolution in plasma treated CVD TiN thinfilms used as diffusion barriers, SOL ST ELEC, 43(6), 1999, pp. 1063-1068