Authors: Doh, HH Chu, C Chi, KK Moon, JT

Citation: Hh. Doh et al., Surface analysis for selective SiO2 etching by reflectance photoelastic modulated fourier transform infrared spectroscopy, JPN J A P 1, 40(10), 2001, pp. 6109-6114

Authors: Sheridan, TE Chi, KK

Citation: Te. Sheridan et Kk. Chi, Characterization of m =-1 helicons, PHYS LETT A, 271(5-6), 2000, pp. 391-397

Authors: Chi, KK Sheridan, TE Boswell, RW

Citation: Kk. Chi et al., Resonant cavity modes of a bounded helicon discharge, PLASMA SOUR, 8(3), 1999, pp. 421-431

Authors: Spicer, ST Chi, KK Nankivell, BJ Larcos, G Farlow, DC Choong, KKL Chapman, JR Gruenewald, SM

Citation: St. Spicer et al., Mercaptoacetyltriglycine diuretic renography and output efficiency measurement in renal transplant patients, EUR J NUCL, 26(2), 1999, pp. 152-154

Authors: Jung, CO Chi, KK Hwang, BG Moon, JT Lee, MY Lee, JG

Citation: Co. Jung et al., Advanced plasma technology in microelectronics, THIN SOL FI, 341(1-2), 1999, pp. 112-119