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Results:
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Results: 2
The leakage current effect of thin gate oxides (2.4-2.7 nm) with in situ native oxide desorption
Authors:
Lai, JM Chieng, WH Lin, BC Chin, A Tsai, C
Citation:
Jm. Lai et al., The leakage current effect of thin gate oxides (2.4-2.7 nm) with in situ native oxide desorption, J ELCHEM SO, 146(6), 1999, pp. 2216-2218
Precision alignment of mask etching with respect to crystal orientation
Authors:
Lai, JM Chieng, WH Huang, YC
Citation:
Jm. Lai et al., Precision alignment of mask etching with respect to crystal orientation, J MICROM M, 8(4), 1998, pp. 327-329
Risultati:
1-2
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