Citation: Sm. Yun et al., Low-dielectric-constant-film deposition with various gases in a helicon plasma reactor, JPN J A P 1, 38(7B), 1999, pp. 4531-4534
Citation: Ck. Choi et al., Study on dynamic separation of silica slurry using a rotating membrane filter: 2. Modelling of cake formation, J MEMBR SCI, 157(2), 1999, pp. 177-187
Authors:
Kang, MS
Lee, KM
Byun, JC
Kim, DS
Choi, CK
Lee, JY
Kim, KH
Citation: Ms. Kang et al., Formation and characterization of the MgO protecting layer deposited by plasma-enhanced metal-organic chemical-vapor deposition, J KOR PHYS, 35, 1999, pp. S447-S451
Citation: Ck. Choi et al., Palladium-catalyzed three-component coupling reaction of aryl halides, norbornadiene and alkynols. Convenient synthesis for their ternary coupling products, CHEM LETT, (11), 1999, pp. 1253-1254
Authors:
Oh, KS
Kang, MS
Lee, KM
Kim, DS
Choi, CK
Yun, SM
Chang, HY
Kim, KH
Citation: Ks. Oh et al., Formation and characterization of the fluorocarbonated-SiO2 films by O-2/FTES-helicon plasma chemical vapor deposition, THIN SOL FI, 345(1), 1999, pp. 45-49
Citation: Sm. Yun et al., Low dielectric constant CF/SiOF composite film deposition in a helicon plasma reactor, THIN SOL FI, 341(1-2), 1999, pp. 109-111