Authors: Lamontagne, B Stapledon, J Chow-Chong, P Buchanan, M Fraser, J Phillips, J Davies, M

Citation: B. Lamontagne et al., InP etching using chemically assisted ion beam etching (Cl-2/Ar) - Formation of InClx clusters under high concentration of chlorine, J ELCHEM SO, 146(5), 1999, pp. 1918-1920