Authors: Barge, M Bruynooghe, S Clube, F Nobari, A Saussol, JL Grass, E Mayer, H Schnabel, B Kley, EB

Citation: M. Barge et al., 120-nm lithography using off-axis TIR holography and 364 nm exposure wavelength, MICROEL ENG, 57-8, 2001, pp. 59-63