Citation: P. Alpuim et al., Doping of amorphous and microcrystalline silicon films deposited at low substrate temperatures by hot-wire chemical vapor deposition, J VAC SCI A, 19(5), 2001, pp. 2328-2334
Authors:
Balberg, I
Naidis, R
Fonseca, LF
Weisz, SZ
Conde, JP
Alpuim, P
Chu, V
Citation: I. Balberg et al., Sensitization of the electron lifetime in a-Si : H: The story of oxygen - art. no. 113201, PHYS REV B, 6311(11), 2001, pp. 3201
Authors:
Conde, JP
Alpuim, P
Boucinha, M
Gaspar, J
Chu, V
Citation: Jp. Conde et al., Amorphous and microcrystalline silicon deposited by hot-wire chemical vapor deposition at low substrate temperatures: application to devices and thin-film microelectromechanical systems, THIN SOL FI, 395(1-2), 2001, pp. 105-111
Citation: P. Alpuim et al., Low substrate temperature deposition of amorphous and microcrystalline silicon films on plastic substrates by hot-wire chemical vapor deposition, J NON-CRYST, 266, 2000, pp. 110-114
Authors:
Chu, V
Silva, H
Redondo, LM
Jesus, C
Silva, MF
Soares, JC
Conde, JP
Citation: V. Chu et al., Ion implantation of microcrystalline silicon for low process temperature top gate thin film transistors, THIN SOL FI, 337(1-2), 1999, pp. 203-207
Citation: P. Alpuim et al., Amorphous and microcrystalline silicon films grown at low temperatures by radio-frequency and hot-wire chemical vapor deposition, J APPL PHYS, 86(7), 1999, pp. 3812-3821
Citation: Rc. Sousa et al., Vertical integration of a spin dependent tunnel junction with an amorphousSi diode for MRAM application, IEEE MAGNET, 35(5), 1999, pp. 2832-2834
Citation: Rc. Sousa et al., Vertical integration of a spin dependent tunnel junction with an amorphousSi diode, APPL PHYS L, 74(25), 1999, pp. 3893-3895