Authors: Chun, M Kim, B Conrad, JR Matyi, RJ Malik, SM Fetherston, P Han, S

Citation: M. Chun et al., High dose rate effects in silicon by plasma source ion implantation, J VAC SCI B, 17(2), 1999, pp. 863-866

Authors: Nono, MCA Corat, EJ Ueda, M Stellati, C Barroso, JJ Conrad, JR Shamim, M Fetherston, P Sridharan, K

Citation: Mca. Nono et al., Surface modification on 304 SS by plasma-immersed ion implantation to improve the adherence of a CVD diamond film, SURF COAT, 112(1-3), 1999, pp. 295-298