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Citation: D. Bullen et al., In situ technique for dynamic fluid film pressure measurement during chemical mechanical polishing, J ELCHEM SO, 147(7), 2000, pp. 2741-2743

Authors: Coppeta, J Rogers, C Racz, L Philipossian, A Kaufman, FB

Citation: J. Coppeta et al., Investigating slurry transport beneath a wafer during chemical mechanical polishing processes, J ELCHEM SO, 147(5), 2000, pp. 1903-1909