Authors:
Bullen, D
Scarfo, A
Koch, A
Bramono, DPY
Coppeta, J
Racz, L
Citation: D. Bullen et al., In situ technique for dynamic fluid film pressure measurement during chemical mechanical polishing, J ELCHEM SO, 147(7), 2000, pp. 2741-2743
Authors:
Coppeta, J
Rogers, C
Racz, L
Philipossian, A
Kaufman, FB
Citation: J. Coppeta et al., Investigating slurry transport beneath a wafer during chemical mechanical polishing processes, J ELCHEM SO, 147(5), 2000, pp. 1903-1909