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Wang, ZG
Parker, CG
Hodge, DW
Croswell, RT
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Citation: Zg. Wang et al., Effect of polysilicon gate type on the flatband voltage shift for ultrathin oxide-nitride gate stacks, IEEE ELEC D, 21(4), 2000, pp. 170-172
Authors:
Croswell, RT
Reisman, A
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Williams, CK
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Authors:
Simpson, DL
Croswell, RT
Reisman, A
Williams, CK
Temple, D
Citation: Dl. Simpson et al., Deposition and characterization of undoped and boron and phosphorus doped (SixGe1-xO2) glass films, J ELCHEM SO, 147(4), 2000, pp. 1560-1567
Authors:
Croswell, RT
Reisman, A
Simpson, DL
Temple, D
Williams, CK
Citation: Rt. Croswell et al., Differential thermal analysis of glass mixtures containing SiO2, GeO2, B2O3, and P2O5, J ELCHEM SO, 146(12), 1999, pp. 4569-4579
Authors:
Simpson, DL
Croswell, RT
Reisman, A
Temple, D
Williams, CK
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