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Results: 1-9 |
Results: 9
Density of N-2 (X (1)Sigma(+)(g); upsilon=18) molecules in a dc glow discharge measured by cavity ringdown spectroscopy at 227 nm; validity domain ofthe technique
Authors: Macko, P Cunge, G Sadeghi, N
Citation: P. Macko et al., Density of N-2 (X (1)Sigma(+)(g); upsilon=18) molecules in a dc glow discharge measured by cavity ringdown spectroscopy at 227 nm; validity domain ofthe technique, J PHYS D, 34(12), 2001, pp. 1807-1811
Anomalous skin effect and collisionless power dissipation in inductively coupled discharges
Authors: Cunge, G Crowley, B Vender, D Turner, MM
Citation: G. Cunge et al., Anomalous skin effect and collisionless power dissipation in inductively coupled discharges, J APPL PHYS, 89(7), 2001, pp. 3580-3589
Absolute fluorine atom concentrations in fluorocarbon plasmas determined from CF2 loss kinetics
Authors: Cunge, G Chabert, P Booth, JP
Citation: G. Cunge et al., Absolute fluorine atom concentrations in fluorocarbon plasmas determined from CF2 loss kinetics, J APPL PHYS, 89(12), 2001, pp. 7750-7755
Reactive ion etching of silicon carbide in SF6 gas: Detection of CF, CF2, and SiF2 etch products
Authors: Chabert, P Cunge, G Booth, JP Perrin, J
Citation: P. Chabert et al., Reactive ion etching of silicon carbide in SF6 gas: Detection of CF, CF2, and SiF2 etch products, APPL PHYS L, 79(7), 2001, pp. 916-918
Ultraviolet cavity ring-down spectroscopy of free radicals in etching plasmas
Authors: Booth, JP Cunge, G Biennier, L Romanini, D Kachanov, A
Citation: Jp. Booth et al., Ultraviolet cavity ring-down spectroscopy of free radicals in etching plasmas, CHEM P LETT, 317(6), 2000, pp. 631-636
Characterization of the E to H transition in a pulsed inductively coupled plasma discharge with internal coil geometry: bi-stability and hysteresis
Authors: Cunge, G Crowley, B Vender, D Turner, MM
Citation: G. Cunge et al., Characterization of the E to H transition in a pulsed inductively coupled plasma discharge with internal coil geometry: bi-stability and hysteresis, PLASMA SOUR, 8(4), 1999, pp. 576-586
CF2 production and loss mechanisms in fluorocarbon discharges: Fluorine-poor conditions and polymerization
Authors: Cunge, G Booth, JP
Citation: G. Cunge et Jp. Booth, CF2 production and loss mechanisms in fluorocarbon discharges: Fluorine-poor conditions and polymerization, J APPL PHYS, 85(8), 1999, pp. 3952-3959
CFx radical production and loss in a CF4 reactive ion etching plasma: Fluorine rich conditions
Authors: Booth, JP Cunge, G Chabert, P Sadeghi, N
Citation: Jp. Booth et al., CFx radical production and loss in a CF4 reactive ion etching plasma: Fluorine rich conditions, J APPL PHYS, 85(6), 1999, pp. 3097-3107
High mass positive ions and molecules in capacitively-coupled radio-frequency CF4 plasmas
Authors: Schwarzenbach, W Cunge, G Booth, JP
Citation: W. Schwarzenbach et al., High mass positive ions and molecules in capacitively-coupled radio-frequency CF4 plasmas, J APPL PHYS, 85(11), 1999, pp. 7562-7568
Risultati: 1-9 |