Authors: Joubert, O Czuprynski, P

Citation: O. Joubert et P. Czuprynski, Characterization of dielectric etching processes by X-ray photoelectron spectroscopy analyses in high aspect ratio contact holes, JPN J A P 1, 38(10), 1999, pp. 6154-6160

Authors: Czuprynski, P Joubert, O Vallier, L Sadeghi, N

Citation: P. Czuprynski et al., Operating high-density plasma sources in a low-density range: Applicationsto metal etch processes, J VAC SCI A, 17(5), 1999, pp. 2572-2580