Authors: WESTERHEIM AC JONES RD MAGER PJ DUBASH JH DALTON TJ GOSS MW BAUM SK DASS SK

Citation: Ac. Westerheim et al., HIGH-DENSITY, INDUCTIVELY-COUPLED PLASMA ETCH OF SUB HALF-MICRON CRITICAL LAYERS - TRANSISTOR POLYSILICON GATE DEFINITION AND CONTACT FORMATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(5), 1998, pp. 2699-2706

Authors: BOSKIN ED DALTON TJ

Citation: Ed. Boskin et Tj. Dalton, PRODUCTION EVALUATION OF REAL-TIME STATISTICAL PROCESS-CONTROL ON A SUB-O.5 MU-M INDUCTIVELY-COUPLED METAL ETCH PROCESS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 1371-1376

Authors: DALTON TJ CONNER WT SAWIN HH

Citation: Tj. Dalton et al., INTERFEROMETRIC REAL-TIME MEASUREMENT OF UNIFORMITY FOR PLASMA-ETCHING, Journal of the Electrochemical Society, 141(7), 1994, pp. 1893-1900

Authors: DALTON TJ ARNOLD JC SAWIN HH SWAN S CORLISS D

Citation: Tj. Dalton et al., MICROTRENCH FORMATION IN POLYSILICON PLASMA-ETCHING OVER THIN GATE OXIDE, Journal of the Electrochemical Society, 140(8), 1993, pp. 2395-2401