Citation: Ed. Boskin et Tj. Dalton, PRODUCTION EVALUATION OF REAL-TIME STATISTICAL PROCESS-CONTROL ON A SUB-O.5 MU-M INDUCTIVELY-COUPLED METAL ETCH PROCESS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 1371-1376
Citation: Tj. Dalton et al., INTERFEROMETRIC REAL-TIME MEASUREMENT OF UNIFORMITY FOR PLASMA-ETCHING, Journal of the Electrochemical Society, 141(7), 1994, pp. 1893-1900
Authors:
DALTON TJ
ARNOLD JC
SAWIN HH
SWAN S
CORLISS D
Citation: Tj. Dalton et al., MICROTRENCH FORMATION IN POLYSILICON PLASMA-ETCHING OVER THIN GATE OXIDE, Journal of the Electrochemical Society, 140(8), 1993, pp. 2395-2401