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DOWNSTREAM PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF SINX-H FILMS FROM HEXAMETHYLCYCLOTRISILAZANE
Authors:
SMIRNOVA TP YAKOVKINA LV AMOSOV YI DANILOVICH OV
Citation:
Tp. Smirnova et al., DOWNSTREAM PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF SINX-H FILMS FROM HEXAMETHYLCYCLOTRISILAZANE, Inorganic materials, 32(6), 1996, pp. 615-619
Risultati:
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