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Results: 1-10 |
Results: 10
THERMAL-CHARACTERISTICS OF AN X-RAY MASK DURING PATTERN TRANSFER
Authors: RESNICK DJ PENDHARKAR SV DAUKSHER WJ CUMMINGS KD LAUDON MF ROMANOWICZ B RENAUD P ENGELSTAD RL
Citation: Dj. Resnick et al., THERMAL-CHARACTERISTICS OF AN X-RAY MASK DURING PATTERN TRANSFER, Microelectronic engineering, 42, 1998, pp. 287-290
UNIFORM LOW-STRESS OXYNITRIDE FILMS FOR APPLICATION AS HARDMASKS ON X-RAY MASKS
Authors: DAUKSHER WJ RESNICK DJ SMITH SM PENDHARKAR SV TOMPKINS HG CUMMINGS KD SEESE PA MANGAT PJS CHAN JA
Citation: Wj. Dauksher et al., UNIFORM LOW-STRESS OXYNITRIDE FILMS FOR APPLICATION AS HARDMASKS ON X-RAY MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2232-2237
OPTIMIZATION OF AN ELECTRON-CYCLOTRON-RESONANCE ETCH PROCESS USING FULL WAFER CHARGE-COUPLED-DEVICE INTERFEROMETRY
Authors: PENDHARKAR SV RESNICK DJ DAUKSHER WJ CUMMINGS KD TEPERMEISTER I CONNER WT
Citation: Sv. Pendharkar et al., OPTIMIZATION OF AN ELECTRON-CYCLOTRON-RESONANCE ETCH PROCESS USING FULL WAFER CHARGE-COUPLED-DEVICE INTERFEROMETRY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 816-819
OPTIMIZATION OF THE REFRACTORY X-RAY MASK FABRICATION SEQUENCE
Authors: CUMMINGS KD DAUKSHER WJ JOHNSON WA LAUDON MF ENGELSTAD R
Citation: Kd. Cummings et al., OPTIMIZATION OF THE REFRACTORY X-RAY MASK FABRICATION SEQUENCE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4323-4327
ETCH CHARACTERISTICS OF AN AMORPHOUS REFRACTORY ABSORBER
Authors: RESNICK DJ PENDHARKAR SV DAUKSHER WJ CUMMINGS KD JOHNSON WA CONSTANTINE C
Citation: Dj. Resnick et al., ETCH CHARACTERISTICS OF AN AMORPHOUS REFRACTORY ABSORBER, Microelectronic engineering, 30(1-4), 1996, pp. 211-214
THE EFFECT OF APERTURING ON RADIATION DAMAGE-INDUCED PATTERN DISTORTION OF X-RAY MASKS
Authors: RESNICK DJ CUMMINGS KD DAUKSHER WJ JOHNSON WA SEESE PA CHEN HTH WELLS GM ENGELSTAD R CERRINA F
Citation: Dj. Resnick et al., THE EFFECT OF APERTURING ON RADIATION DAMAGE-INDUCED PATTERN DISTORTION OF X-RAY MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3046-3049
THERMAL-ANALYSIS OF AN X-RAY MASK MEMBRANE IN A PLASMA ENVIRONMENT
Authors: LAUDON MF THOLE KA ENGELSTAD RL RESNICK DJ CUMMINGS KD DAUKSHER WJ
Citation: Mf. Laudon et al., THERMAL-ANALYSIS OF AN X-RAY MASK MEMBRANE IN A PLASMA ENVIRONMENT, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3050-3054
METHOD FOR FABRICATING A LOW-STRESS X-RAY MASK USING ANNEALABLE AMORPHOUS REFRACTORY COMPOUNDS
Authors: DAUKSHER WJ RESNICK DJ CUMMINGS KD BAKER J GREGORY RB THEODORE ND CHAN JA JOHNSON WA MOGAB CJ NICOLET MA REID JS
Citation: Wj. Dauksher et al., METHOD FOR FABRICATING A LOW-STRESS X-RAY MASK USING ANNEALABLE AMORPHOUS REFRACTORY COMPOUNDS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3103-3108
EFFECT OF BRIGHTENER CONCENTRATION ON THE THERMAL DISTORTION OF GOLD PLATED X-RAY MASKS
Authors: DAUKSHER WJ RESNICK DJ SEESE PA CUMMINGS KD YANOF AW JOHNSON WA
Citation: Wj. Dauksher et al., EFFECT OF BRIGHTENER CONCENTRATION ON THE THERMAL DISTORTION OF GOLD PLATED X-RAY MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3990-3994
A NEW OPERATING REGIME FOR ELECTROPLATING THE GOLD ABSORBER ON X-RAY MASKS
Authors: DAUKSHER WJ RESNICK DJ JOHNSON WA YANOF AW
Citation: Wj. Dauksher et al., A NEW OPERATING REGIME FOR ELECTROPLATING THE GOLD ABSORBER ON X-RAY MASKS, Microelectronic engineering, 23(1-4), 1994, pp. 235-238
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