Authors: BLAKENEY A GABOR A WHITE D STEINHAUSLER T DEADY W JARMALOWICZ J KUNZ R DEAN K RICH G STARK D

Citation: A. Blakeney et al., SILICON-RICH-METHACRYLATE BILAYER RESIST FOR 193-NM LITHOGRAPHY, Solid state technology, 41(6), 1998, pp. 69