Authors: WEILL A AMBLARD G DEBAENE F SAGE D

Citation: A. Weill et al., RESIST POLARITY CHANGES DURING THE SILYATION PROCESS, Microelectronic engineering, 21(1-4), 1993, pp. 227-230

Authors: WEILL A JOUBERT O PANIEZ P DEBAENE F PONS M SAGE D

Citation: A. Weill et al., MELT FLOW OF THE SILYLATED AREAS DURING THE DESIRE PROCESS, Microelectronic engineering, 21(1-4), 1993, pp. 251-254